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PFEIFFER EVR116 pneumatic control valve

PFEIFFER EVR116

PFEIFFER EVR116(3)

PFEIFFER EVR116(4)

PFEIFFER EVR116(5)

PFEIFFER EVR116(6)

EVR116 functions and features:

High flow coefficient can achieve high flow.

Wide control range, suitable for fine control.

Compact and lightweight design, saving space.

Durable structure ensures long-term use.

EVR116 application areas:

Semiconductor manufacturing: used to control gas flow and ensure the stability and consistency of the production process.

Thin film deposition: Precisely control the vacuum environment during the thin film deposition process.

Optical coating: In the preparation process of optical coatings, the gas flow rate is controlled to obtain the required coating quality.

Vacuum furnace: In vacuum furnace operation, control the gas flow to maintain the required vacuum degree.

Leakage detection: Detect leaks in the vacuum system to ensure the sealing of the system.

EVR116 technical parameters:

Suitable for high-pressure applications.

Provide manual or actuator operation methods.

External dimensions KF16 (mm), weight 0.5 (kg).

Measurement range: 0.00001-10Pa (Pa).

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